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SPIE Proceedings [SPIE Santa Cl - DL tentative - Santa Clara, CA (Saturday 15 September 1990)] Advanced Techniques for Integrated Circuit Processing - Real-time, in-situ measurement of film thickness and uniformity during plasma ashing of photoresist
Davies, John T., Metz, Thomas E., Savage, Richard N., Simmons, Horace O., Bondur, James A., Turner, Terry R.Volume:
1392
Year:
1991
Language:
english
DOI:
10.1117/12.48948
File:
PDF, 131 KB
english, 1991