![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography
Kumazaki, Takahito, Suzuki, Toru, Tanaka, Satoshi, Nohdomi, Ryoichi, Yoshino, Masaya, Matsumoto, Shinichi, Kawasuji, Yasufumi, Umeda, Hiroshi, Nagano, Hitoshi, Kakizaki, Kouji, Nakarai, Hiroaki, MatsuVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.778149
File:
PDF, 352 KB
english, 2008