![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Blended novolac resins with improved lithographic performance
Lynch, Thomas J., Sobodacha, Chet J., Paradis, Valerie R., Durham, Dana L., Canize, Anthony, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154795
File:
PDF, 626 KB
english, 1993