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SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Study on modeling of resist heating effect correction in EB mask writer EBM-9000
Yoshioka, Nobuyuki, Nomura, Haruyuki, Kamikubo, Takashi, Suganuma, Mizuna, Kato, Yasuo, Yashima, Jun, Nakayamada, Noriaki, Anze, Hirohito, Ogasawara, MunehiroVolume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2199615
File:
PDF, 427 KB
english, 2015