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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Improved electron backscattering representation using a new class of distribution: application to EUV masks
Figueiro, T., Saib, M., Jedidi, N., Schiavone, P., Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916419
File:
PDF, 751 KB
english, 2012