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[IEEE 2007 Non-Volatile Memory Technology Symposium - Albuquerque, NM (2007.11.10-2007.11.13)] 2007 Non-Volatile Memory Technology Symposium - Reliability Demonstration of a Ferroelectric Random Access Memory Embedded within a 130nm CMOS Process
Rodriguez, J., Remack, K., Gertas, J., Boku, K., Udayakumar, K.R., Summerfelt, S., Shinn, G., Madan, S., McAdams, H., Moise, T., Eliason, J., Bailey, R., Depner, M., Kim, D., Staubs, P.Year:
2007
Language:
english
DOI:
10.1109/NVMT.2007.4389948
File:
PDF, 404 KB
english, 2007