SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Advanced self-aligned DP process development for 22-nm node and beyond
Hara, Arisa, Nishimura, Eiichi, Kushibiki, Masato, Yamauchi, Shoichi, Natori, Sakurako, Yabe, Kazuo, Oyama, Kenichi, Yaeasghi, Hidetami, Allen, Robert D.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846465
File:
PDF, 966 KB
english, 2010