Al2O3 thin films deposited by thermal atomic layer...

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Thin Solid Films 2016 / 2

Al2O3 thin films deposited by thermal atomic layer deposition: Characterization for photovoltaic applications

Barbos, Corina, Blanc-Pelissier, Danièle, Fave, Alain, Blanquet, Elisabeth, Crisci, Alexandre, Lemiti, Mustapha
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Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2016.02.049
Date:
February, 2016
File:
PDF, 640 KB
english, 2016
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