In situ surface cleaning on a Ge substrate using TMA and...

Journal of Materials Chemistry C 2015 Vol. 3; Iss. 19

In situ surface cleaning on a Ge substrate using TMA and MgCp 2 for HfO 2 -based gate oxides

Oh, Il-Kwon, Kim, Kangsik, Lee, Zonghoon, Song, Jeong-Gyu, Lee, Chang Wan, Thompson, David, Lee, Han-Bo-Ram, Kim, Woo-Hee, Maeng, Wan Joo, Kim, Hyungjun
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Volume:
3
Year:
2015
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/C4TC02686A
File:
PDF, 3.25 MB
english, 2015
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