SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Dry etch challenges for CD shrinkage in memory process
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Matsushita, Takaya, Matsumoto, Takanori, Mukai, Hidefumi, Kyoh, Suigen, Hashimoto, KohjiVolume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2085628
File:
PDF, 443 KB
english, 2015