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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Newly developed acrylic copolymers for ArF photoresist
Kamon, Yoshihiro, Momose, Hikaru, Kuwano, Hideaki, Fujiwara, Tadayuki, Fujimoto, Masaharu, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474263
File:
PDF, 54 KB
english, 2002