SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Positive Photoresist Development: A Multiple State Percolation Model
Trefonas III, Peter, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953061
File:
PDF, 596 KB
english, 1989