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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Prediction of resist sensitivity for 13.5-nm EUV and 6.x-nm EUV extension from sensitivity for EBL
Oyama, Tomoko G., Naulleau, Patrick P., Oshima, Akihiro, Dang, Tuan N., Enomoto, Satoshi, Washio, Masakazu, Tagawa, SeiichiVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011442
File:
PDF, 559 KB
english, 2013