SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Benchmarking study of 3D mask modeling for 2X and 1X nodes
Wang, ChangAn, Conley, Will, Liang, Chao-Chun, Liu, Huikan, Kallingal, Chidam, Dunn, Derren N., Oberschmidt, James, Tirapu Azpiroz, JaioneVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011485
File:
PDF, 1.69 MB
english, 2013