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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Effect of leaving group design on EUV lithography performance
Ongayi, Owendi, Naulleau, Patrick P., Jain, Vipul, Coley, Suzanne M., Valeri, David, Kwok, Amy, Quach, Dung, Wagner, Mike, Cameron, Jim, Thackeray, Jim W.Volume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011600
File:
PDF, 1.76 MB
english, 2013