SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Impact of EUV mask roughness on lithography performance
Arisawa, Yukiyasu, Naulleau, Patrick P., Terasawa, Tsuneo, Watanabe, HidehiroVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011635
File:
PDF, 1.52 MB
english, 2013