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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography
Fukuhara, Kazuya, Conley, Will, Mimotogi, Akiko, Kono, Takuya, Aoyama, Hajime, Ogata, Taro, Kita, Naonori, Matsuyama, TomoyukiVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011691
File:
PDF, 2.18 MB
english, 2013