SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Photoinhibited superresolution lithography: overcoming chemical blur
Resnick, Douglas J., Bencher, Christopher, Forman, Darren L., McLeod, Robert R.Volume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2063254
File:
PDF, 836 KB
english, 2014