SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - A fast and flexible library-based thick-mask near-field calculation method
Lai, Kafai, Erdmann, Andreas, Ma, Xu, Gao, Jie, Chen, Xuanbo, Dong, Lisong, Li, YanqiuVolume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2085010
File:
PDF, 933 KB
english, 2015