SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Self-aligned quadruple patterning-compliant placement
Sturtevant, John L., Capodieci, Luigi, Nakajima, Fumiharu, Kodama, Chikaaki, Nakayama, Koichi, Nojima, Shigeki, Kotani, ToshiyaVolume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2085705
File:
PDF, 734 KB
english, 2015