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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Akaike information criterion to select well-fit resist models
Sturtevant, John L., Capodieci, Luigi, Burbine, Andrew, Fryer, David, Sturtevant, JohnVolume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2085770
File:
PDF, 271 KB
english, 2015