![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Effect of χ N and underlayer composition on self-assembly of thin films of block copolymers with energy asymmetric block
Resnick, Douglas J., Bencher, Christopher, Lawson, Richard A., Peters, Andrew J., Nation, Benjamin D., Ludovice, Peter J., Henderson, Clifford L.Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2086047
File:
PDF, 3.60 MB
english, 2015