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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Electron energy distribution control by fiat: breaking from the conventional flux ratio scaling rules in etch
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Ranjan, Alok, Wang, Mingmei, Sherpa, Sonam, Ventzek, PeterVolume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2086604
File:
PDF, 665 KB
english, 2015