SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Novel CD control of HTPSM by advanced process for sub-20nm tech
Hayashi, Naoya, Kasprowicz, Bryan S., Jo, Sangjin, Choi, Chungseon, Oh, Sunghyun, Ha, Taejoong, Lee, Youngmo, Kim, Sangpyo, Yim, DonggyuVolume:
9635
Year:
2015
Language:
english
DOI:
10.1117/12.2196938
File:
PDF, 594 KB
english, 2015