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SPIE Proceedings [SPIE Applied Optics and Photonics China (AOPC2015) - Beijing, China (Tuesday 5 May 2015)] AOPC 2015: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques - Echelle and etalon used for spectral metrology of excimer laser lithographic light sources at 193nm
Li, Lin, Hong, Minghui, Jiang, Lan, Gao, Fei, Zhao, Jiangshan, Liu, Guangyi, Wang, Qian, Bai, LujunVolume:
9673
Year:
2015
Language:
english
DOI:
10.1117/12.2199380
File:
PDF, 520 KB
english, 2015