SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Development of high-transmittance phase-shifting mask for ArF immersion lithography
Yoshioka, Nobuyuki, Ahn, Won-suk, Seo, Hwan-Seok, Bang, Ju-Mi, Kim, Ji-Young, Song, Jae-Min, Seung, Byoung-Hoon, Kim, Hee-Bom, Jeon, Chan-UkVolume:
9658
Year:
2015
Language:
english
DOI:
10.1117/12.2203239
File:
PDF, 1.47 MB
english, 2015