SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Process window optimizer for pattern-based defect prediction on 28nm metal layer
Sanchez, Martha I., Ukraintsev, Vladimir A., Fanton, P., La Greca, R., Jain, V., Prentice, C., Simiz, J.-G., Hunsche, S., Le-Gratiet, B., Depre, L.Volume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2220295
File:
PDF, 1.91 MB
english, 2016
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