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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Conductive bilevel resist system based on polysilphenylenesiloxane and polyaniline for nanometer lithography
Watanabe, Keiji, Igarashi, Miwa, Yano, EiVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312379
File:
PDF, 1019 KB
english, 1998