SPIE Proceedings [SPIE 23rd Annual International Symposium...

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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Feasibility of a CVD-resist-based lithography process at 193-nm wavelength

Lee, Carol Y., Das, Siddhartha, Yang, John W., Weidman, Timothy W., Sugiarto, Dian, Nault, Michael P., Mui, David, Osborne, Zoe A.
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Volume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312392
File:
PDF, 1.75 MB
english, 1998
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