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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Probabilistic model for the mechanism of phenolic polymer dissolution
Flanagin, Lewis W., McAdams, Christopher L., Tsiartas, Pavlos C., Henderson, Clifford L., Hinsberg, William D., Willson, C. GrantVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312416
File:
PDF, 831 KB
english, 1998