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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Characterizing polymer bound PAG-type EUV resist
Tamaoki, Hiroshi, Allen, Robert D., Somervell, Mark H., Tarutani, Shinji, Tsubaki, Hideaki, Takahashi, Toshiya, Inoue, Naoki, Tsuchihashi, Tooru, Takizawa, Hiroo, Takahashi, HidenoriVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879394
File:
PDF, 4.75 MB
english, 2011