A Low-Leakage Epitaxial High-κ Gate Oxide for Germanium...

ACS Applied Materials & Interfaces 2016 / 03 Vol. 8; Iss. 8

A Low-Leakage Epitaxial High-κ Gate Oxide for Germanium Metal–Oxide–Semiconductor Devices

Hu, Chengqing, McDaniel, Martin D., Jiang, Aiting, Posadas, Agham, Demkov, Alexander A., Ekerdt, John G., Yu, Edward T.
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Volume:
8
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.5b10661
Date:
March, 2016
File:
PDF, 1.91 MB
english, 2016
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