[IEEE 2014 IEEE International Electron Devices Meeting...

  • Main
  • [IEEE 2014 IEEE International Electron...

[IEEE 2014 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2014.12.15-2014.12.17)] 2014 IEEE International Electron Devices Meeting - Dramatic effects of hydrogen-induced out-diffusion of oxygen from Ge surface on junction leakage as well as electron mobility in n-channel Ge MOSFETs

Lee, Choong Hyun, Nishimura, Tomonori, Cimang Lu,, Kabuyanagi, Shoichi, Toriumi, Akira
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2014
Language:
english
DOI:
10.1109/iedm.2014.7047156
File:
PDF, 370 KB
english, 2014
Conversion to is in progress
Conversion to is failed