[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - A novel approach to generate self-aligned Ge/SiO2/SiGe gate-stacking structures in a single fabrication step
Lai, Wei-Ting, Yang, Kuo-Ching, Hsu, Ting-Chia, Liao, Po-Hsiang, George, Thomas, Li, Pei-WenYear:
2014
Language:
english
DOI:
10.1109/snw.2014.7348582
File:
PDF, 552 KB
english, 2014