SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly
Sato, Hironobu, Tong, William M., Resnick, Douglas J., Yonemitsu, Hiroki, Seino, Yuriko, Kato, Hirokazu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Kodera, Katsuyoshi, Azuma, TsukasaVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2009622
File:
PDF, 910 KB
english, 2013