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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Role of 3D photo-resist simulation for advanced technology nodes
Narayana Samy, Aravind, Conley, Will, Seltmann, Rolf, Kahlenberg, Frank, Schramm, Jessy, Küchler, Bernd, Klostermann, UlrichVolume:
8683
Year:
2013
Language:
english
DOI:
10.1117/12.2011427
File:
PDF, 647 KB
english, 2013