SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Heat behavior of extreme-ultraviolet pellicle including mesh support
Kim, In-Seon, Naulleau, Patrick P., Kim, Eun-Jin, Kim, Ji-Won, Oh, Hye-KeunVolume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2012288
File:
PDF, 432 KB
english, 2013