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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Contrast enhanced exposure strategy in multi-beam mask writing
Belic, Nikola, Tong, William M., Resnick, Douglas J., Hofmann, Ulrich, Klikovits, Jan, Martens, StephanVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2014148
File:
PDF, 677 KB
english, 2013