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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - REBL DPG lenslet structure: design for charging prevention
Resnick, Douglas J., Bencher, Christopher, Lin, Shy-Jay, Bao, T. I., Lu, C. W., Wang, S.-C., Chien, T. C., Shin, J.-J., Lin, Burn J., McCord, Mark A., Brodie, Alan, Carroll, Allen, Grella, LucaVolume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2045416
File:
PDF, 487 KB
english, 2014