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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Robust complementary technique with multiple-patterning for sub-10 nm node device
Wallow, Thomas I., Hohle, Christoph K., Oyama, Kenichi, Yamauchi, Shohei, Natori, Sakurako, Hara, Arisa, Yamato, Masatoshi, Yaegashi, HidetamiVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046236
File:
PDF, 1.39 MB
english, 2014