SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Streamlined etch integration with a unique neutral layer for self-assembled block copolymers (BCPs)

Resnick, Douglas J., Bencher, Christopher, Hockey, Mary Ann, Xu, Kui, Wang, Yubao, Guerrero, Douglas J., Calderas, Eric
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Volume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2046351
File:
PDF, 2.65 MB
english, 2014
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