SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Mohanty, Nihar, Franke, Elliott, Liu, Eric, Raley, Angelique, Smith, Jeffrey, Farrell, Richard, Wang, Mingmei, Ito, Kiyohito, Das, Sanjana, Ko, AkVolume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2085016
File:
PDF, 1.10 MB
english, 2015
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