SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Layout optimization with assist features placement by model based rule tables for 2x node random contact
Sturtevant, John L., Capodieci, Luigi, Jun, Jinhyuck, Park, Minwoo, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Do, Munhoe, Lee, Dongchan, Kim, Taehoon, Choi, Junghoe, Luk-Pat, Gerard, Miloslavsky, AlexVolume:
9427
Year:
2015
Language:
english
DOI:
10.1117/12.2085460
File:
PDF, 1013 KB
english, 2015