SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
Wallow, Thomas I., Hohle, Christoph K., Toida, Takumi, Suzuki, Akihiro, Uchiyama, Naoya, Makinoshima, Takashi, Takasuka, Masaaki, Sato, Takashi, Echigo, MasatoshiVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085470
File:
PDF, 540 KB
english, 2015