SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - 120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography
Lai, Kafai, Erdmann, Andreas, Ohta, Takeshi, Ishida, Keisuke, Kumazaki, Takahito, Tsushima, Hiroaki, Kurosu, Akihiko, Kakizaki, Kouji, Matsunaga, Takashi, Mizoguchi, HakaruVolume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2085631
File:
PDF, 683 KB
english, 2015