SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography
Wallow, Thomas I., Hohle, Christoph K., Lorusso, Gian F., Mao, Ming, Reijnen, Liesbeth, Viatkina, Katja, Knops, Roel, Rispens, Gijsbert, Fliervoet, TimonVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085722
File:
PDF, 577 KB
english, 2015