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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - A way to integrate multiple block layers for middle of line contact patterning
Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Kunnen, E., Demuynck, S., Brouri, M., Boemmels, J., Versluijs, J., Ryckaert, J.Volume:
9428
Year:
2015
Language:
english
DOI:
10.1117/12.2086081
File:
PDF, 832 KB
english, 2015