SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists
Lai, Kafai, Erdmann, Andreas, Pistor, Thomas V., Wang, Chenchen, Wang, Yan, Yuan, Lei, Kye, Jongwook, Wu, Yixu, Mehta, Sohan, Ackmann, PaulVolume:
9426
Year:
2015
Language:
english
DOI:
10.1117/12.2087376
File:
PDF, 1.20 MB
english, 2015