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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Metrology target design (MTD) solution for diagonally orientated DRAM layer
Sanchez, Martha I., Ukraintsev, Vladimir A., Lee, Myungjun, Smith, Mark D., Adel, Michael E., Chen, Chia-Hung, Huang, Chin-Chang, Huang, Hao-Lun, Tsai, Hsueh-Jen, Wang, I-Lin, Huang, Jen-Chou, Chin, JVolume:
9778
Year:
2016
Language:
english
DOI:
10.1117/12.2218659
File:
PDF, 7.11 MB
english, 2016