SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Chemically amplified ArF resists based on cleavable alicyclic group and the absorption band shift method
Shida, Naomi, Okino, Takeshi, Asakawa, Koji, Ushirogouchi, Tohru, Nakase, MakotoVolume:
3333
Year:
1998
Language:
english
DOI:
10.1117/12.312341
File:
PDF, 904 KB
english, 1998